Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/12060
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dc.contributor.advisorMavani, Krushna R.-
dc.contributor.authorMandal, Satyabrata-
dc.date.accessioned2023-06-28T08:51:51Z-
dc.date.available2023-06-28T08:51:51Z-
dc.date.issued2023-06-07-
dc.identifier.urihttps://dspace.iiti.ac.in/handle/123456789/12060-
dc.description.abstractThe thesis reports on the structural, electronic transport, and vibrational properties of NdNi1-xGaxO3 (x = 0 – 0.2) thin films grown on LaAlO3 (001)(LAO) substrates using the pulsed laser deposition method. The structural investigations show that the thin films experience compressive in-plane strain. The temperature dependent resistivity curves indicate that NdNiO3(NNO) film undergoes an electronic phase transition from metal to insulator, while 20% of Ga doping shows totally insulating behaviour below room temperature. The overall resistivity of the system increases systematically with a gradual increase in Ga doping. The resistivity results exhibit a close agreement with the power law equation with the indication of the non-Fermi liquid state. The Ga doping at Ni site in NdNiO3 thin films shows a systematic red-shift of Raman modes. These findings provide insights into the properties of NdNi1 xGaxO3 thin films and their potential applications in electronic devices.en_US
dc.language.isoenen_US
dc.publisherDepartment of Physics, IIT Indoreen_US
dc.relation.ispartofseriesMS403;-
dc.subjectPhysicsen_US
dc.titleEffects of Ga-doping on structural, electronic, and vibrational properties of NdNiO3 thin filmsen_US
dc.typeThesis_M.Scen_US
Appears in Collections:Department of Physics_ETD

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