Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/17174
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dc.contributor.authorShirage, Parasharam Marutien_US
dc.date.accessioned2025-11-12T16:56:47Z-
dc.date.available2025-11-12T16:56:47Z-
dc.date.issued2025-
dc.identifier.citationTarwal, N. L., Patil, K. v., Redekar, R. S., & Shirage, P. M. (2025). Physico-Chemical Properties of Spin-Coated Nanostructured TiO2 Thin Films. ChemistrySelect, 10(39). https://doi.org/10.1002/slct.202503321en_US
dc.identifier.issn2365-6549-
dc.identifier.otherEID(2-s2.0-105019394951)-
dc.identifier.urihttps://dx.doi.org/10.1002/slct.202503321-
dc.identifier.urihttps://dspace.iiti.ac.in:8080/jspui/handle/123456789/17174-
dc.description.abstractNanostructured TiO<inf>2</inf> thin films were deposited using the simple, low-cost spin coating method. The compactness, uniformity, and crystallinity of the spin-coated TiO<inf>2</inf> thin films were optimized by depositing successive spin-coating layers. The XRD analysis revealed the formation of the TiO<inf>2</inf> anatase phase. The crystallite size ranged from 20 to 27 nm as the deposition layers increased. The TiO<inf>2</inf> nanoparticles were compact and uniformly distributed over the entire glass substrate. Also, Raman analysis confirmed the formation of anatase TiO<inf>2</inf>. The single emission peak in the photoluminescence spectra of TiO<inf>2</inf> thin films revealed the formation of the pure anatase phase. From the UV–vis spectroscopy, the band gap of TiO<inf>2</inf> thin films was in the range of 3.21–3.30 eV. Overall, the transparent, crack-free, and uniform TiO<inf>2</inf> thin films can be used for energy applications. © 2025 Elsevier B.V., All rights reserved.en_US
dc.language.isoenen_US
dc.publisherJohn Wiley and Sons Incen_US
dc.sourceChemistrySelecten_US
dc.subjectBand gapen_US
dc.subjectPhotoluminescenceen_US
dc.subjectSpin coatingen_US
dc.subjectThickness variationen_US
dc.subjectThin filmsen_US
dc.subjectTiO2en_US
dc.titlePhysico-Chemical Properties of Spin-Coated Nanostructured TiO2 Thin Filmsen_US
dc.typeJournal Articleen_US
Appears in Collections:Department of Metallurgical Engineering and Materials Sciences

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