Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/18550
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dc.contributor.authorBharadwaj, Nishchalen_US
dc.date.accessioned2026-07-09T06:42:07Z-
dc.date.available2026-07-09T06:42:07Z-
dc.date.issued2026-
dc.identifier.citationReddy, K. P. K., Kimbulapitiya, Wani, S. S., Bharadwaj, N., Yadav, S. N. S., Mohanty, S., Reddy, G. P., Rehman, B., & Reddy, P. R. S. (2026). Tuning the Electrocatalytic Performance of Cobalt Thin Films via Oxygen Annealing for Oxygen Evolution Reactions in Alkaline Media. Catalysis Letters, 156(6). https://doi.org/10.1007/s10562-026-05398-1en_US
dc.identifier.issn1011-372X-
dc.identifier.otherEID(2-s2.0-105039637772)-
dc.identifier.urihttps://dx.doi.org/10.1007/s10562-026-05398-1-
dc.identifier.urihttps://dspace.iiti.ac.in:8080/jspui/handle/123456789/18550-
dc.description.abstractThe deposition of thin films using vacuum techniques is highly desirable for device fabrication due to the high reproducibility, uniformity, smoothness, and desired thickness. In this report, cobalt thin films were fabricated by the thermal evaporation methoden_US
dc.description.abstractthe as-prepared samples were annealed at different temperatures (350��C, 450��C and 550��C) in an oxygen atmosphere to form cobalt oxide. The method of metal thin-film annealing not only transforms them into metal oxides but also reduces major defects, having a significant impact on device performance. Various characterizations examined the morphological and structural characteristics of the altered samples. The electronic structure of cobalt thin films was extracted from DFT calculations. The sample annealed at 350��C showed the lowest Tafel slope of 119 mV/dec. As the annealing temperature is raised while using these samples for oxygen evolution reaction applications in 0.5�M KOH solution, the electrode performance rapidly declines. Therefore, the present study demonstrates that the deposited thin films for electrocatalysis applications are potentially used for energy production. � The Author(s), under exclusive licence to Springer Science+Business Media, LLC, part of Springer Nature 2026.en_US
dc.language.isoenen_US
dc.publisherSpringeren_US
dc.sourceCatalysis Lettersen_US
dc.titleTuning the Electrocatalytic Performance of Cobalt Thin Films via Oxygen Annealing for Oxygen Evolution Reactions in Alkaline Mediaen_US
dc.typeJournal Articleen_US
Appears in Collections:Department of Chemistry

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