Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/18639
Title: Barrier Layer Optimization of DIBS-grown MgZnO/CdZnO Heterojunction for High Mobility
Authors: Mahapatra, Brahmadutta
Yadav, Saurabh
Chaudhary, Sumit
Usha
Mukjerjee, Shaibal
Issue Date: 2026
Publisher: Institute of Electrical and Electronics Engineers Inc.
Citation: Mahapatra, B., Yadav, S., Chaudhary, S., Usha, Htay Yamamoto, M. T., & Mukjerjee, S. (2026). Barrier Layer Optimization of DIBS-grown MgZnO/CdZnO Heterojunction for High Mobility. 10th IEEE Electron Devices Technology and Manufacturing Conference: Emerging Semiconductor Devices and Manufacturing Technologies, EDTM 2026. https://doi.org/10.1109/EDTM65772.2026.11496710
Abstract: This work explores the effect of Mg composition and growth environment of the MgZnO barrier layer in dual ion beam sputtering (DIBS) grown MgZnO/CdZnO heterostructure. Results suggest that a lower Mg composition of 5% provides higher mobility by reducing lattice mismatch and to form a well-defined heterojunction. Further, the presence of O2 during the growth environment reduces the carrier mobility (μ) of the two-dimensional electron gas, while increasing the carrier charge density (ns). The optimized heterojunction exhibited an increase in μ from 6.9 cm2/Vs to 28 cm2/Vs while the ns reduces from 3.22 × 1015 cm-2 to 4.22× 1013 cm-2. These findings are crucial for developing DIBS grown MgZnO/CdZnO high electron mobility transistors. © 2026 IEEE.
URI: https://dx.doi.org/10.1109/EDTM65772.2026.11496710
https://dspace.iiti.ac.in:8080/jspui/handle/123456789/18639
ISBN: 979-833158598-3
Type of Material: Conference Paper
Appears in Collections:Centre for Advanced Electronics (CAE)
Department of Electrical Engineering

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