Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/18677
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dc.contributor.authorNirala, Rohit Kumaren_US
dc.contributor.authorKranti, Abhinaven_US
dc.date.accessioned2026-07-09T06:48:16Z-
dc.date.available2026-07-09T06:48:16Z-
dc.date.issued2026-
dc.identifier.citationSamant, N., Agavekar, A. A., Ganesh, D., Nirala, R. K., Gupta, M., & Kranti, A. (2026). Enabling Logic-in-Memory (LiM) Functionality with Junctionless FeFETs. 2026 International VLSI Symposium on Technology, Systems and Applications, VLSI TSA 2026 - Proceedings of Technical Papers. https://doi.org/10.1109/VLSITSA69131.2026.11527893en_US
dc.identifier.isbn979-833156238-0-
dc.identifier.otherEID(2-s2.0-105041905149)-
dc.identifier.urihttps://dx.doi.org/10.1109/VLSITSA69131.2026.11527893-
dc.identifier.urihttps://dspace.iiti.ac.in:8080/jspui/handle/123456789/18677-
dc.description.abstractImplementing logic (NOR/NAND) by utilizing the polarization of HZO ferroelectric (Fe) layer in field effect transistors (FETs) opens new possibilities for realizing logic operations within memory. Despite the relatively simpler fabrication process, junctionless (JL) Fe FETs exhibit a degraded State 1 and are unsuitable for implementing logic-in-memory (LiM). The drawback is addressed through a co-optimization of channel doping (1018 cm-3 instead of 1019 cm-3) and gate workfunction (midgap 4.7 eV rather than 5 eV) which enables NOR/NAND operations in JL FeFETs and their adaptation in LiM modules. © 2026 IEEE.en_US
dc.language.isoenen_US
dc.publisherInstitute of Electrical and Electronics Engineers Inc.en_US
dc.source2026 International VLSI Symposium on Technology, Systems and Applications, VLSI TSA 2026 - Proceedings of Technical Papersen_US
dc.titleEnabling Logic-in-Memory (LiM) Functionality with Junctionless FeFETsen_US
dc.typeConference Paperen_US
Appears in Collections:Department of Electrical Engineering

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