Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/5054
Full metadata record
DC FieldValueLanguage
dc.contributor.authorSiddharth, Gauraven_US
dc.contributor.authorSingh, Ruchi A.en_US
dc.contributor.authorDubey, Mayanken_US
dc.contributor.authorMukherjee, Shaibalen_US
dc.date.accessioned2022-03-17T01:00:00Z-
dc.date.accessioned2022-03-17T15:38:34Z-
dc.date.available2022-03-17T01:00:00Z-
dc.date.available2022-03-17T15:38:34Z-
dc.date.issued2021-
dc.identifier.citationSiddharth, G., Singh, R., Dubey, M., Htay, M. T., & Mukherjee, S. (2021). Optimization of dual ion beam sputtered MQWs for solar cell. Paper presented at the Conference Record of the IEEE Photovoltaic Specialists Conference, 392-394. doi:10.1109/PVSC43889.2021.9518577en_US
dc.identifier.isbn9781665419222-
dc.identifier.issn0160-8371-
dc.identifier.otherEID(2-s2.0-85115919842)-
dc.identifier.urihttps://doi.org/10.1109/PVSC43889.2021.9518577-
dc.identifier.urihttps://dspace.iiti.ac.in/handle/123456789/5054-
dc.description.abstractIn this work, fabrication of CdZnO/ZnO-based multiple quantum wells (MQWs) by dual ion beam sputtering (DIBS) is optimized based on different deposition temperature and halt time between deposition of consecutive layers to achieve improved quality deposition of well and barrier layers for solar cell application. The effect of deposition temperature and halt time are analyzed and discussed systematically by secondary ion mass spectroscopy (SIMS) and high-resolution transmission electron microscopy (HR-TEM). The results show that, MQWs structure fabricated at 100 °C as deposition temperature and having halt time of 30 min, shows better formation of well and barrier layers compared to other deposition temperatures and halt time. © 2021 IEEE.en_US
dc.language.isoenen_US
dc.publisherInstitute of Electrical and Electronics Engineers Inc.en_US
dc.sourceConference Record of the IEEE Photovoltaic Specialists Conferenceen_US
dc.subjectIon beamsen_US
dc.subjectIonsen_US
dc.subjectSecondary ion mass spectrometryen_US
dc.subjectSemiconductor quantum wellsen_US
dc.subjectSolar cellsen_US
dc.subjectBarrier layersen_US
dc.subjectDeposition temperaturesen_US
dc.subjectDual ion beamen_US
dc.subjectDual ion beam sputteringen_US
dc.subjectHigh-resolution transmission electron microscopyen_US
dc.subjectMultiple quantum-well structuresen_US
dc.subjectMultiple-quantum-well structuresen_US
dc.subjectOptimisationsen_US
dc.subjectSecondary ion mass spectroscopyen_US
dc.subjectSolar-cell applicationsen_US
dc.subjectHigh resolution transmission electron microscopyen_US
dc.titleOptimization of dual ion beam sputtered MQWs for solar cellen_US
dc.typeConference Paperen_US
Appears in Collections:Department of Electrical Engineering

Files in This Item:
There are no files associated with this item.


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

Altmetric Badge: