Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/5080
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dc.contributor.authorSingh, Laliten_US
dc.contributor.authorJain, Sourabh P.en_US
dc.contributor.authorSulabhen_US
dc.contributor.authorKumar, Mukeshen_US
dc.date.accessioned2022-03-17T01:00:00Z-
dc.date.accessioned2022-03-17T15:38:38Z-
dc.date.available2022-03-17T01:00:00Z-
dc.date.available2022-03-17T15:38:38Z-
dc.date.issued2021-
dc.identifier.citationSingh, L., Jain, S., Sulabh, & Kumar, M. (2021). Loss compensation in hybrid plasmonic waveguide by controlled electron injection. Paper presented at the Springer Proceedings in Physics, , 258 487-489. doi:10.1007/978-981-15-9259-1_111en_US
dc.identifier.isbn9789811592584-
dc.identifier.issn0930-8989-
dc.identifier.otherEID(2-s2.0-85103299983)-
dc.identifier.urihttps://doi.org/10.1007/978-981-15-9259-1_111-
dc.identifier.urihttps://dspace.iiti.ac.in/handle/123456789/5080-
dc.description.abstractThe optical loss is compensated for tightly confined hybrid plasmonic mode in dielectric layer of 10-nm using controlled electron injection. The electron tunneling by band bending of high index layer of InGaP and leaky optical mode coupled with plasmonic mode provide low loss plasmonic device with smaller mode area of λ2/200. The InGaP provide larger tunneling current compared to silicon for loss compensation of guided mode. The phase modulation provides 670-µm of Pi shift wavelength with optical gain of 2.39 dB of intensity. The proposed device can be used in the application of optical interconnects and modulation. © 2021, The Author(s), under exclusive license to Springer Nature Singapore Pte Ltd.en_US
dc.language.isoenen_US
dc.publisherSpringer Science and Business Media Deutschland GmbHen_US
dc.sourceSpringer Proceedings in Physicsen_US
dc.subjectElectron injectionen_US
dc.subjectElectron tunnelingen_US
dc.subjectGallium alloysen_US
dc.subjectGallium compoundsen_US
dc.subjectIndium alloysen_US
dc.subjectModulationen_US
dc.subjectOptical signal processingen_US
dc.subjectSemiconductor alloysen_US
dc.subjectDielectric layeren_US
dc.subjectHigh-index layersen_US
dc.subjectHybrid plasmonic waveguidesen_US
dc.subjectLoss compensationen_US
dc.subjectOptical modesen_US
dc.subjectPlasmonic devicesen_US
dc.subjectPlasmonic modesen_US
dc.subjectTunneling currenten_US
dc.subjectPlasmonicsen_US
dc.titleLoss Compensation in Hybrid Plasmonic Waveguide by Controlled Electron Injectionen_US
dc.typeConference Paperen_US
Appears in Collections:Department of Electrical Engineering

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