Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/5199
Title: Effect of back gate voltage on double gate single layer graphene field-effect transistor with improved ion
Authors: Vishvakarma, Santosh Kumar
Keywords: Drain current;Field effect transistors;Gate dielectrics;Graphene;Hafnium oxides;Ions;Threshold voltage;Back-gate voltages;Double gate;Graphene field-effect transistors;High dielectric constant materials;Hole conduction;On currents;Single layer;Graphene transistors
Issue Date: 2019
Publisher: Springer Science and Business Media, LLC
Citation: Shukla, G., Upadhyay, A., & Vishvakarma, S. K. (2019). Effect of back gate voltage on double gate single layer graphene field-effect transistor with improved ion. Paper presented at the Springer Proceedings in Physics, , 215 21-28. doi:10.1007/978-3-319-97604-4_4
Abstract: In this paper, the effect of back gate voltage on drain current in a double gate single layer graphene field effect transistor is shown through a developed mathematical model. Through this structure and employing high dielectric constant material (HfO2) as top gate dielectric, result has been improved in terms of ION/IOFF ratio. This device structure is showing further increase in ON current on application of high back gate voltage. This projected mathematical model is valid for both electron and hole conduction to show the effect of back gate voltage on drain current, whereas in this literature high ION/IOFF ratio and high ION have been obtained for hole conduction. © Springer Nature Switzerland AG 2019.
URI: https://doi.org/10.1007/978-3-319-97604-4_4
https://dspace.iiti.ac.in/handle/123456789/5199
ISBN: 9783319976037
ISSN: 0930-8989
Type of Material: Conference Paper
Appears in Collections:Department of Electrical Engineering

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