Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/5680
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dc.contributor.authorSengottaiyan, Rathinaveluen_US
dc.contributor.authorSaxena, Nishanten_US
dc.contributor.authorManivannan, Anbarasuen_US
dc.date.accessioned2022-03-17T01:00:00Z-
dc.date.accessioned2022-03-17T15:43:15Z-
dc.date.available2022-03-17T01:00:00Z-
dc.date.available2022-03-17T15:43:15Z-
dc.date.issued2020-
dc.identifier.citationSengottaiyan, R., Saxena, N., Shukla, K. D., & Manivannan, A. (2020). Temperature dependent structural evolution and crystallization properties of thin Ge15Te85 film revealed by in situ resistance, x-ray diffraction and scanning electron microscopic studies. Journal of Physics D: Applied Physics, 53(2) doi:10.1088/1361-6463/ab4e6ben_US
dc.identifier.issn0022-3727-
dc.identifier.otherEID(2-s2.0-85076085888)-
dc.identifier.urihttps://doi.org/10.1088/1361-6463/ab4e6b-
dc.identifier.urihttps://dspace.iiti.ac.in/handle/123456789/5680-
dc.description.abstractChalcogenide-based Ge15Te85 thin films have recently been explored for ovonic threshold switching (OTS) selector devices for vertically stackable cross-point memory applications. Despite reasonable understanding over its crystallization kinetics and threshold switching properties, the structural stability and morphological acquaintance at elevated temperatures remain key challenges. In this paper, we investigate the thermal stability, surface morphology and local structure of as-deposited amorphous Ge15Te85 thin film starting from room temperature up to 325 °C. Our experimental results reveal that upon heating, the de-vitrification is initiated in the form of localized segregation of Te atoms at 120 C, followed by crystallization of Te at ∼220 C and GeTe at ∼263 C as corroborated by temperature-dependent measurements of electrical resistance, x-ray diffraction and scanning electron microscopic studies. Furthermore, the crystalline areas of these films are characterized by the fine-grained morphology, which clearly distinguishes the segregation of crystallization of Te and GeTe microstructures. These findings elucidate a deeper understanding of the multi-phase crystallization process through morphological evidence, which will be useful towards optimization of materials for OTS selector applications. © 2019 IOP Publishing Ltd.en_US
dc.language.isoenen_US
dc.publisherInstitute of Physics Publishingen_US
dc.sourceJournal of Physics D: Applied Physicsen_US
dc.subjectChalcogenidesen_US
dc.subjectCrystallization kineticsen_US
dc.subjectMorphologyen_US
dc.subjectPhase change materialsen_US
dc.subjectScanning electron microscopyen_US
dc.subjectSegregation (metallography)en_US
dc.subjectStabilityen_US
dc.subjectSurface morphologyen_US
dc.subjectTelluriumen_US
dc.subjectThin filmsen_US
dc.subjectX ray diffractionen_US
dc.subjectChalcogenide thin filmsen_US
dc.subjectCrystallization propertiesen_US
dc.subjectElectrical resistancesen_US
dc.subjectGe15Te85en_US
dc.subjectOTS selectoren_US
dc.subjectScanning electron microscopicen_US
dc.subjectStructural stabilitiesen_US
dc.subjectTemperature-dependent measurementsen_US
dc.subjectGermanium compoundsen_US
dc.titleTemperature dependent structural evolution and crystallization properties of thin Ge15Te85 film revealed by in situ resistance, x-ray diffraction and scanning electron microscopic studiesen_US
dc.typeJournal Articleen_US
Appears in Collections:Department of Electrical Engineering

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