Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/5750
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dc.contributor.authorBhuvaneshwari, Y. V.en_US
dc.contributor.authorKranti, Abhinaven_US
dc.date.accessioned2022-03-17T01:00:00Z-
dc.date.accessioned2022-03-17T15:43:40Z-
dc.date.available2022-03-17T01:00:00Z-
dc.date.available2022-03-17T15:43:40Z-
dc.date.issued2019-
dc.identifier.citationBhuvaneshwari, Y. V., & Kranti, A. (2019). Estimation of doping in junctionless transistors through dc characteristics. Semiconductor Science and Technology, 34(5) doi:10.1088/1361-6641/ab110aen_US
dc.identifier.issn0268-1242-
dc.identifier.otherEID(2-s2.0-85067622239)-
dc.identifier.urihttps://doi.org/10.1088/1361-6641/ab110a-
dc.identifier.urihttps://dspace.iiti.ac.in/handle/123456789/5750-
dc.description.abstractIn this work, a new technique has been developed to extract the doping (N d) of a junctionless (JL) transistor using dc analysis i.e. transfer characteristics. The proposed method utilises the evaluation of bulk mobility (μ bulk) by averaging the values of transconductance (g m) between the limits of threshold (V th) and flatband (V fb) voltages of a junctionless device to account for bulk conduction, which can be subsequently used to extract the doping from the volume current. Results show that the extracted doping values are very close to the doping used in the simulations. The methodology is applied to planar (single gate and double gate) as well as non-planar i.e. triple gate and cylindrical nanowire devices. Impact of gate length downscaling and series resistance is also investigated. The validity of the developed approach to predict the doping is also verified through the experimental data published in the literature. The work showcases the potential of a new and relatively simpler approach to estimate the doping of a junctionless transistor by utilising dc characteristics and avoiding the capacitance measurements that often require careful de-embedding techniques. © 2019 IOP Publishing Ltd.en_US
dc.language.isoenen_US
dc.publisherInstitute of Physics Publishingen_US
dc.sourceSemiconductor Science and Technologyen_US
dc.subjectCapacitanceen_US
dc.subjectCapacitance measurementen_US
dc.subjectDoping (additives)en_US
dc.subjectElectric resistanceen_US
dc.subjectCylindrical nanowiresen_US
dc.subjectDe-embedding techniquesen_US
dc.subjectjunctionlessen_US
dc.subjectJunctionless devicesen_US
dc.subjectJunctionless transistoren_US
dc.subjectJunctionless transistorsen_US
dc.subjectMOS-FETen_US
dc.subjectTransfer characteristicsen_US
dc.subjectTransconductanceen_US
dc.titleEstimation of doping in junctionless transistors through dc characteristicsen_US
dc.typeJournal Articleen_US
Appears in Collections:Department of Electrical Engineering

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