Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/5806
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dc.contributor.authorShalu, C.en_US
dc.contributor.authorSingh, Vipulen_US
dc.date.accessioned2022-03-17T01:00:00Z-
dc.date.accessioned2022-03-17T15:44:03Z-
dc.date.available2022-03-17T01:00:00Z-
dc.date.available2022-03-17T15:44:03Z-
dc.date.issued2018-
dc.identifier.citationShalu, C., Joshi, M. P., & Singh, V. (2018). Solvent assisted improvement of the dielectric properties and hysteresis behavior in poly‑4‑vinylphenol (PVP) thin films. Microelectronic Engineering, 198, 85-92. doi:10.1016/j.mee.2018.07.002en_US
dc.identifier.issn0167-9317-
dc.identifier.otherEID(2-s2.0-85050106411)-
dc.identifier.urihttps://doi.org/10.1016/j.mee.2018.07.002-
dc.identifier.urihttps://dspace.iiti.ac.in/handle/123456789/5806-
dc.description.abstractThe role of casting solvent, for casting the PVP dielectric layer in terms of variation in leakage current, dielectric constant and hysteresis voltage was investigated. The leakage current through the pristine (PVP) and cross linked PVP dielectric thin films cast with two different solvents namely Methanol and propylene glycol methyl ether acetate (PGMEA) was measured. Leakage current and dielectric constant in pristine PVP thin films reduced when low polarity solvent was used for casting the films (PGMEA in our case) and further reduced while PVP was cross linked with polymelamine‑co‑formaldehyde (MMF). This variation in the dielectric constant and the leakage current was attributed to the variation of the –OH group density present at the polymer dielectric thin films cast with different solvents. The variation of –OH group density among the samples was confirmed by the variation of 3290 cm−1 peak intensity, associated with hydroxyl group stretching, in FTIR spectra. Additionally, Contact angle study further revealed that the dielectric thin films cast with different solvents contained different amount of –OH group density. Hysteresis voltage, observed in the MIS structure fabricated on these PVP thin films further confirmed variation in –OH group densities. These results are critical for development of all organic FETs. © 2018 Elsevier B.V.en_US
dc.language.isoenen_US
dc.publisherElsevier B.V.en_US
dc.sourceMicroelectronic Engineeringen_US
dc.subjectContact angleen_US
dc.subjectDielectric materialsen_US
dc.subjectDielectric properties of solidsen_US
dc.subjectFourier transform infrared spectroscopyen_US
dc.subjectHysteresisen_US
dc.subjectLeakage currentsen_US
dc.subjectOrganic solventsen_US
dc.subjectPolymer filmsen_US
dc.subjectDielectric layeren_US
dc.subjectDielectric thin filmsen_US
dc.subjectDifferent solventsen_US
dc.subjectHysteresis behavioren_US
dc.subjectHysteresis voltageen_US
dc.subjectPolymer dielectricsen_US
dc.subjectPolymeric dielectricsen_US
dc.subjectPropylene glycol methyl etheren_US
dc.subjectThin filmsen_US
dc.titleSolvent assisted improvement of the dielectric properties and hysteresis behavior in poly‑4‑vinylphenol (PVP) thin filmsen_US
dc.typeJournal Articleen_US
Appears in Collections:Department of Electrical Engineering

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