Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/5834
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dc.contributor.authorSingh, Ruchi A.en_US
dc.contributor.authorKhan, Md Arifen_US
dc.contributor.authorMukherjee, Shaibalen_US
dc.contributor.authorKranti, Abhinaven_US
dc.date.accessioned2022-03-17T01:00:00Z-
dc.date.accessioned2022-03-17T15:44:14Z-
dc.date.available2022-03-17T01:00:00Z-
dc.date.available2022-03-17T15:44:14Z-
dc.date.issued2018-
dc.identifier.citationSingh, R., Khan, M. A., Mukherjee, S., & Kranti, A. (2018). Role of surface states and interface charges in 2DEG in sputtered ZnO heterostructures. IEEE Transactions on Electron Devices, 65(7), 2850-2854. doi:10.1109/TED.2018.2838546en_US
dc.identifier.issn0018-9383-
dc.identifier.otherEID(2-s2.0-85047647591)-
dc.identifier.urihttps://doi.org/10.1109/TED.2018.2838546-
dc.identifier.urihttps://dspace.iiti.ac.in/handle/123456789/5834-
dc.description.abstractIn this paper, we report on the influence of surface (donor and acceptor) states and interface charges on the formation of 2-D electron gas (2DEG) in MgZnO/ZnO heterostructure grown by sputtering. Donor and acceptor states alone cannot yield an order of magnitude higher value of 2DEG as observed by sputtering growth as compared to epitaxial techniques. While surface donor states are reported to govern the formation of 2DEG in epitaxially grown heterostructures, our simulations suggest a non-negligible contribution of surface acceptor states in the 2DEG density. In addition, the existence of interface charges due to high defect density along with appropriate values of donor and acceptor states is essential to accurately predict an order of magnitude higher 2DEG density grown by sputtering. This paper analyzes the distinct roles of donor and acceptor states along with interface charges in 2DEG formation and achieved values. © 1963-2012 IEEE.en_US
dc.language.isoenen_US
dc.publisherInstitute of Electrical and Electronics Engineers Inc.en_US
dc.sourceIEEE Transactions on Electron Devicesen_US
dc.subjectElectron gasen_US
dc.subjectEpitaxial growthen_US
dc.subjectHeterojunctionsen_US
dc.subjectII-VI semiconductorsen_US
dc.subjectPhase interfacesen_US
dc.subjectSputteringen_US
dc.subjectZinc oxideen_US
dc.subject2-D electron gas (2DEG)en_US
dc.subjectDonor and acceptoren_US
dc.subjectEpitaxial techniquesen_US
dc.subjectEpitaxially grownen_US
dc.subjectHigh defect densitiesen_US
dc.subjectSheet charge densityen_US
dc.subjectSputtering growthen_US
dc.subjectZinc oxide (ZnO)en_US
dc.subjectInterface statesen_US
dc.titleRole of Surface States and Interface Charges in 2DEG in Sputtered ZnO Heterostructuresen_US
dc.typeJournal Articleen_US
Appears in Collections:Department of Electrical Engineering

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