Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/5838
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dc.contributor.authorKhan, Md Arifen_US
dc.contributor.authorSingh, Ruchi A.en_US
dc.contributor.authorKranti, Abhinaven_US
dc.contributor.authorMukherjee, Shaibalen_US
dc.date.accessioned2022-03-17T01:00:00Z-
dc.date.accessioned2022-03-17T15:44:15Z-
dc.date.available2022-03-17T01:00:00Z-
dc.date.available2022-03-17T15:44:15Z-
dc.date.issued2018-
dc.identifier.citationKhan, M. A., Singh, R., Bhardwaj, R., Kumar, A., Das, A. K., Misra, P., . . . Mukherjee, S. (2018). Enhanced sheet charge density in DIBS grown CdO alloyed ZnO buffer based heterostructure. IEEE Electron Device Letters, 39(6), 827-830. doi:10.1109/LED.2018.2829761en_US
dc.identifier.issn0741-3106-
dc.identifier.otherEID(2-s2.0-85046001544)-
dc.identifier.urihttps://doi.org/10.1109/LED.2018.2829761-
dc.identifier.urihttps://dspace.iiti.ac.in/handle/123456789/5838-
dc.description.abstractIn this letter, we report on achieving significantly high (6×) sheet charge density (ns) in MgZnO/CdZnO heterostructure, as compared with that in MgZnO/ZnO, at lower Mg (≤ 0.15) compositions in barrier MgZnO layer, with both heterostructures grown by dual ion beam sputtering technique. Buffer CdZnO and barrier MgZnO layers are probed separately to investigate carrier density in defect prone sputtered layers. Capacitance-voltage measurement and temperature-dependent Hall measurement confirm the presence of quantum confined carrier density at barrier-buffer interface, suggesting that the enhancement in carrier densities in the heterostructure over individual layers is probably due to the formation of 2-D electron gas (2-DEG). © 1980-2012 IEEE.en_US
dc.language.isoenen_US
dc.publisherInstitute of Electrical and Electronics Engineers Inc.en_US
dc.sourceIEEE Electron Device Lettersen_US
dc.subjectCadmium alloysen_US
dc.subjectCadmium compoundsen_US
dc.subjectCapacitanceen_US
dc.subjectCarrier concentrationen_US
dc.subjectCharge carriersen_US
dc.subjectCharge densityen_US
dc.subjectDensity measurement (specific gravity)en_US
dc.subjectElectron gasen_US
dc.subjectHeterojunctionsen_US
dc.subjectII-VI semiconductorsen_US
dc.subjectIon beamsen_US
dc.subjectMagnetic semiconductorsen_US
dc.subjectPhase interfacesen_US
dc.subjectSemiconductor alloysen_US
dc.subjectSputteringen_US
dc.subjectTemperature measurementen_US
dc.subjectTwo dimensional electron gasen_US
dc.subjectVoltage measurementen_US
dc.subjectWide band gap semiconductorsen_US
dc.subjectZinc oxideen_US
dc.subjectBuffer interfacesen_US
dc.subjectCapacitance voltage measurementsen_US
dc.subjectDIBSen_US
dc.subjectDual ion beam sputteringen_US
dc.subjectHall measurementsen_US
dc.subjectSheet charge densityen_US
dc.subjectSputtered layersen_US
dc.subjectTemperature dependenten_US
dc.subjectZinc alloysen_US
dc.titleEnhanced Sheet Charge Density in DIBS Grown CdO Alloyed ZnO Buffer Based Heterostructureen_US
dc.typeJournal Articleen_US
Appears in Collections:Department of Electrical Engineering

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