Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/5925
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dc.contributor.authorKhan, Md Arifen_US
dc.contributor.authorMukherjee, Shaibalen_US
dc.contributor.authorKranti, Abhinaven_US
dc.date.accessioned2022-03-17T01:00:00Z-
dc.date.accessioned2022-03-17T15:44:53Z-
dc.date.available2022-03-17T01:00:00Z-
dc.date.available2022-03-17T15:44:53Z-
dc.date.issued2017-
dc.identifier.citationSingh, R., Khan, M. A., Mukherjee, S., & Kranti, A. (2017). Analytical model for 2DEG density in graded MgZnO/ZnO heterostructures with cap layer. IEEE Transactions on Electron Devices, 64(9), 3661-3667. doi:10.1109/TED.2017.2721437en_US
dc.identifier.issn0018-9383-
dc.identifier.otherEID(2-s2.0-85023622408)-
dc.identifier.urihttps://doi.org/10.1109/TED.2017.2721437-
dc.identifier.urihttps://dspace.iiti.ac.in/handle/123456789/5925-
dc.description.abstractIn this paper, we develop a generic analytical model for 2-D electron gas (2DEG) density (ns) and threshold voltage (VOFF) of a fully strained graded ZnO-based heterostructure with a cap layer. The model is based on the continuity of electric field at the interfaces of different layers, dominant piezoelectric and spontaneous polarization components in different layers, Mg composition, and layer thickness. The generic model can be reduced to a simplified bilayer structure for calculating ns and VOFF. Results show that the graded heterostructure can result in higher values of 2DEG density and VOFF (absolute values) compared to the bilayer structure. A careful optimization of the structure is required to achieve a trade-off between ns and VOFF. An analytical expression of polarization charge density at buffer-barrier interface to better fit the experimental data available in the literature is also proposed. The model will be suitable for the design optimization of 2DEG density and VOFF for ZnO-based heterostructures. © 1963-2012 IEEE.en_US
dc.language.isoenen_US
dc.publisherInstitute of Electrical and Electronics Engineers Inc.en_US
dc.sourceIEEE Transactions on Electron Devicesen_US
dc.subjectAluminum gallium nitrideen_US
dc.subjectElectric fieldsen_US
dc.subjectElectron gasen_US
dc.subjectHeterojunctionsen_US
dc.subjectHigh electron mobility transistorsen_US
dc.subjectII-VI semiconductorsen_US
dc.subjectPolarizationen_US
dc.subjectSemiconductor materialsen_US
dc.subjectStructural optimizationen_US
dc.subjectThreshold voltageen_US
dc.subjectZinc oxideen_US
dc.subject2-D electron gas (2DEG)en_US
dc.subjectAnalytical expressionsen_US
dc.subjectBi-layer structureen_US
dc.subjectDesign optimizationen_US
dc.subjectDifferent layersen_US
dc.subjectGeneric modelingen_US
dc.subjectPolarization charge densitiesen_US
dc.subjectSpontaneous polarizationsen_US
dc.subjectAnalytical modelsen_US
dc.titleAnalytical Model for 2DEG Density in Graded MgZnO/ZnO Heterostructures with Cap Layeren_US
dc.typeJournal Articleen_US
Appears in Collections:Department of Electrical Engineering

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