Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/5932
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dc.contributor.authorKranti, Abhinaven_US
dc.date.accessioned2022-03-17T01:00:00Z-
dc.date.accessioned2022-03-17T15:44:56Z-
dc.date.available2022-03-17T01:00:00Z-
dc.date.available2022-03-17T15:44:56Z-
dc.date.issued2017-
dc.identifier.citationGupta, M., & Kranti, A. (2017). Hysteresis free negative total gate capacitance in junctionless transistors. Semiconductor Science and Technology, 32(9) doi:10.1088/1361-6641/aa7e51en_US
dc.identifier.issn0268-1242-
dc.identifier.otherEID(2-s2.0-85028769720)-
dc.identifier.urihttps://doi.org/10.1088/1361-6641/aa7e51-
dc.identifier.urihttps://dspace.iiti.ac.in/handle/123456789/5932-
dc.description.abstractIn this work, we report on the hysteresis free impact ionization induced off-to-on transition while preserving sub-60 mV/decade Subthreshold swing (S-swing) using asymmetric mode operation in double gate silicon (Si) and germanium (Ge) junctionless (JL) transistor. It is shown that sub-60 mV/decade steep switching due to impact ionization implies a negative value of the total gate capacitance. The performance of asymmetric gate JL transistor is compared with symmetric gate operation of JL device, and the condition for hysteresis free current transition with a sub-60 mV/decade switching is analyzed through the product of current density (J) and electric field (E). It is shown that asymmetric gate operation limits the degree of impact ionization inherent in the semiconductor film to levels sufficient for negative total gate capacitance but lower than that required for the occurrence of hysteresis. The work highlights new viewpoints related to the suppression of hysteresis associated with steep switching JL transistors while maintaining S-swing within the range 6-15 mV/decade leading to the negative value of total gate capacitance. © 2017 IOP Publishing Ltd.en_US
dc.language.isoenen_US
dc.publisherInstitute of Physics Publishingen_US
dc.sourceSemiconductor Science and Technologyen_US
dc.subjectCapacitanceen_US
dc.subjectElectric fieldsen_US
dc.subjectGermaniumen_US
dc.subjectHysteresisen_US
dc.subjectIonizationen_US
dc.subjectMOSFET devicesen_US
dc.subjectTransistorsen_US
dc.subjectCurrent transitionsen_US
dc.subjectDouble gate MOSFETen_US
dc.subjectDouble gate siliconen_US
dc.subjectjunctionlessen_US
dc.subjectJunctionless transistoren_US
dc.subjectJunctionless transistorsen_US
dc.subjectSemiconductor filmsen_US
dc.subjectSubthreshold swingen_US
dc.subjectImpact ionizationen_US
dc.titleHysteresis free negative total gate capacitance in junctionless transistorsen_US
dc.typeJournal Articleen_US
Appears in Collections:Department of Electrical Engineering

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