Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/6109
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dc.contributor.authorKumar, Ashishen_US
dc.date.accessioned2022-03-17T01:00:00Z-
dc.date.accessioned2022-03-17T15:46:22Z-
dc.date.available2022-03-17T01:00:00Z-
dc.date.available2022-03-17T15:46:22Z-
dc.date.issued2014-
dc.identifier.citationKumar, A., & Baghini, M. S. (2014). Experimental study for selection of electrode material for ZnO-based memristors. Electronics Letters, 50(21), 1547-1549. doi:10.1049/el.2014.1491en_US
dc.identifier.issn0013-5194-
dc.identifier.otherEID(2-s2.0-84907900114)-
dc.identifier.urihttps://doi.org/10.1049/el.2014.1491-
dc.identifier.urihttps://dspace.iiti.ac.in/handle/123456789/6109-
dc.description.abstractThe fabrication and characterisation of 400 nm-thick zinc oxide (ZnO)- based memristor devices with platinum (Pt), chromium (Cr) and gold (Au) metal electrodes are presented. The effect of these electrode materials on the performance of ZnO-based memristors has been experimentally studied. Metal/ZnO contact limits the memristor switching mechanism, dominating during the resistive switching. It is observed that the ZnO-based memristor with the Pt electrode shows a better hysteresis compared to Cr and Au metal electrodes. In the case of the Pt electrode, a current ratio of six times in magnitude is observed between the high resistive state and low resistive state at 1 V, where a maximum current density value of 1.25 A/cm2 is measured. The capacitance of these devices strongly depends on the charge distributed on the surface. Therefore, the capacitance-voltage (C-V) behaviour can be used to understand the charge distribution, under various bias conditions. The C-V behaviour of the Pt memristor, so as to understand the contact interface, where the maximum capacitance of 2.3 × 10-7 F/cm2 is obtained at 0 V, is also explained. © The Institution of Engineering and Technology 2014.en_US
dc.language.isoenen_US
dc.publisherInstitution of Engineering and Technologyen_US
dc.sourceElectronics Lettersen_US
dc.subjectCapacitanceen_US
dc.subjectII-VI semiconductorsen_US
dc.subjectMemristorsen_US
dc.subjectOxide mineralsen_US
dc.subjectPlatinumen_US
dc.subjectZinc oxideen_US
dc.subjectCapacitance voltageen_US
dc.subjectContact interfaceen_US
dc.subjectElectrode materialen_US
dc.subjectHigh resistive stateen_US
dc.subjectMaximum current densityen_US
dc.subjectResistive switchingen_US
dc.subjectSwitching mechanismen_US
dc.subjectZinc oxide (ZnO)en_US
dc.subjectElectrodesen_US
dc.titleExperimental study for selection of electrode material for ZnO-based memristorsen_US
dc.typeJournal Articleen_US
Appears in Collections:Department of Electrical Engineering

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