Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/6124
Full metadata record
DC FieldValueLanguage
dc.contributor.authorAwasthi, Vishnu Kumaren_US
dc.contributor.authorVerma, Shrutien_US
dc.contributor.authorMukherjee, Shaibalen_US
dc.date.accessioned2022-03-17T01:00:00Z-
dc.date.accessioned2022-03-17T15:46:29Z-
dc.date.available2022-03-17T01:00:00Z-
dc.date.available2022-03-17T15:46:29Z-
dc.date.issued2014-
dc.identifier.citationAwasthi, V., Pandey, S. K., Pandey, S. K., Verma, S., Gupta, M., & Mukherjee, S. (2014). Growth and characterizations of dual ion beam sputtered CIGS thin films for photovoltaic applications. Journal of Materials Science: Materials in Electronics, 25(7), 3069-3076. doi:10.1007/s10854-014-1985-0en_US
dc.identifier.issn0957-4522-
dc.identifier.otherEID(2-s2.0-84902543324)-
dc.identifier.urihttps://doi.org/10.1007/s10854-014-1985-0-
dc.identifier.urihttps://dspace.iiti.ac.in/handle/123456789/6124-
dc.description.abstractThe growth of CIGS thin films on soda-lime glass substrates at different substrate temperatures by dual ion beam sputtering system in a single-step route from a single quaternary sputtering target with the composition of Cu (In 0.70 Ga0.30) Se2 was reported. The effects of the substrate temperature on structural, optical, morphological and electrical properties of CIGS films were investigated. Stoichiometry of one such film was investigated by X-ray photoelectron spectroscopy. All CIGS films had demonstrated a strong (112) orientation located at 2θ ~26.70o, which indicated the chalcopyrite structure of films. The value of full-width at half-maximum of (112) peak was reduced from 0.58° to 0.19° and crystallite size was enlarged from 14.98 to 43.05 nm as growth temperature was increased from 100 to 400 °C. However, atomic force microscope results showed a smooth and uniform surface at lower growth temperature and the surface roughness was observed to increase with increasing growth temperature. Hall measurements exhibited the minimum film resistivity of 0.09 Ω cm with a hole concentration of 2.42 × 1018 cm-3 and mobility of 28.60 cm2 V-1 s-1 for CIGS film grown at 100 °C. Film absorption coefficient was found to enhance nominally from 1 × 105 to 2.3 × 105 cm-1 with increasing growth temperature from 100 to 400 °C. © 2014 Springer Science+Business Media New York.en_US
dc.language.isoenen_US
dc.publisherSpringer New York LLCen_US
dc.sourceJournal of Materials Science: Materials in Electronicsen_US
dc.subjectAtomic force microscopyen_US
dc.subjectElectric propertiesen_US
dc.subjectGallium alloysen_US
dc.subjectGrowth temperatureen_US
dc.subjectHall mobilityen_US
dc.subjectSemiconducting selenium compoundsen_US
dc.subjectSubstratesen_US
dc.subjectSurface roughnessen_US
dc.subjectThin filmsen_US
dc.subjectX ray photoelectron spectroscopyen_US
dc.subjectAbsorption co-efficienten_US
dc.subjectChalcopyrite structuresen_US
dc.subjectDifferent substratesen_US
dc.subjectDual ion beam sputtering systemsen_US
dc.subjectHall measurementsen_US
dc.subjectPhotovoltaic applicationsen_US
dc.subjectSoda lime glass substrateen_US
dc.subjectSubstrate temperatureen_US
dc.subjectFilm growthen_US
dc.titleGrowth and characterizations of dual ion beam sputtered CIGS thin films for photovoltaic applicationsen_US
dc.typeJournal Articleen_US
Appears in Collections:Department of Electrical Engineering

Files in This Item:
There are no files associated with this item.


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

Altmetric Badge: