Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/6150
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dc.contributor.authorKranti, Abhinaven_US
dc.date.accessioned2022-03-17T01:00:00Z-
dc.date.accessioned2022-03-17T15:46:44Z-
dc.date.available2022-03-17T01:00:00Z-
dc.date.available2022-03-17T15:46:44Z-
dc.date.issued2012-
dc.identifier.citationParihar, M. S., Ghosh, D., Armstrong, G. A., Yu, R., Razavi, P., & Kranti, A. (2012). Bipolar effects in unipolar junctionless transistors. Applied Physics Letters, 101(9) doi:10.1063/1.4748909en_US
dc.identifier.issn0003-6951-
dc.identifier.otherEID(2-s2.0-84865856113)-
dc.identifier.urihttps://doi.org/10.1063/1.4748909-
dc.identifier.urihttps://dspace.iiti.ac.in/handle/123456789/6150-
dc.description.abstractIn this work, we analyze hysteresis and bipolar effects in unipolar junctionless transistors. A change in subthreshold drain current by 5 orders of magnitude is demonstrated at a drain voltage of 2.25 V in silicon junctionless transistor. Contrary to the conventional theory, increasing gate oxide thickness results in (i) a reduction of subthreshold slope (S-slope) and (ii) an increase in drain current, due to bipolar effects. The high sensitivity to film thickness in junctionless devices will be most crucial factor in achieving steep transition from ON to OFF state. © 2012 American Institute of Physics.en_US
dc.language.isoenen_US
dc.sourceApplied Physics Lettersen_US
dc.subjectBipolar effectsen_US
dc.subjectConventional theoryen_US
dc.subjectDrain voltageen_US
dc.subjectGate oxide thicknessen_US
dc.subjectHigh sensitivityen_US
dc.subjectJunctionlessen_US
dc.subjectOrders of magnitudeen_US
dc.subjectSubthresholden_US
dc.subjectSubthreshold slopeen_US
dc.subjectPhysical propertiesen_US
dc.subjectPhysicsen_US
dc.titleBipolar effects in unipolar junctionless transistorsen_US
dc.typeJournal Articleen_US
Appears in Collections:Department of Electrical Engineering

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