Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/6152
Full metadata record
DC FieldValueLanguage
dc.contributor.authorVishvakarma, Santosh Kumaren_US
dc.date.accessioned2022-03-17T01:00:00Z-
dc.date.accessioned2022-03-17T15:46:45Z-
dc.date.available2022-03-17T01:00:00Z-
dc.date.available2022-03-17T15:46:45Z-
dc.date.issued2012-
dc.identifier.citationSharma, D., & Kumar Vishvakarma, S. (2012). Analytical modeling for 3D potential distribution of rectangular gate (RecG) gate-all-around (GAA) MOSFET in subthreshold and strong inversion regions. Microelectronics Journal, 43(6), 358-363. doi:10.1016/j.mejo.2012.02.001en_US
dc.identifier.issn0026-2692-
dc.identifier.otherEID(2-s2.0-84859744944)-
dc.identifier.urihttps://doi.org/10.1016/j.mejo.2012.02.001-
dc.identifier.urihttps://dspace.iiti.ac.in/handle/123456789/6152-
dc.description.abstractIn this paper, we have introduced an analytical subthreshold and strong inversion 3D potential model for rectangular gate (RecG) gate-all-around (GAA) MOSFET. The subthreshold and strong inversion potential distribution in channel region of a RecG MOSFET is obtained respectively by solving 3D Laplace and 3D Poisson equations. The assumed parabolic potential distribution along the z-axis in channel direction is appropriately matched with 3D device simulator after consideration of z-depended characteristic length in subthreshold region. For accurate estimation of short channel effects (SCE), the electrostatics near source and drain is corrected. The precise gate-to-gate potential distribution is obtained after consideration of higher order term in assumed parabolic potential profile. The model compares well with numerical data obtained from the 3D ATLAS as a device simulator and deckbuild as an interactive runtime of Silvaco Inc. © 2012 Elsevier Ltd. All rights reserved.en_US
dc.language.isoenen_US
dc.sourceMicroelectronics Journalen_US
dc.subjectCharacteristic lengthen_US
dc.subjectGate-all-around MOSFETen_US
dc.subjectPotentialen_US
dc.subjectRectangular gate (RecG)en_US
dc.subjectStrong inversionen_US
dc.subjectGallium alloysen_US
dc.subjectMOSFET devicesen_US
dc.subjectPoisson equationen_US
dc.subjectThree dimensionalen_US
dc.titleAnalytical modeling for 3D potential distribution of rectangular gate (RecG) gate-all-around (GAA) MOSFET in subthreshold and strong inversion regionsen_US
dc.typeJournal Articleen_US
Appears in Collections:Department of Electrical Engineering

Files in This Item:
There are no files associated with this item.


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

Altmetric Badge: