Please use this identifier to cite or link to this item:
https://dspace.iiti.ac.in/handle/123456789/6152
Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Vishvakarma, Santosh Kumar | en_US |
dc.date.accessioned | 2022-03-17T01:00:00Z | - |
dc.date.accessioned | 2022-03-17T15:46:45Z | - |
dc.date.available | 2022-03-17T01:00:00Z | - |
dc.date.available | 2022-03-17T15:46:45Z | - |
dc.date.issued | 2012 | - |
dc.identifier.citation | Sharma, D., & Kumar Vishvakarma, S. (2012). Analytical modeling for 3D potential distribution of rectangular gate (RecG) gate-all-around (GAA) MOSFET in subthreshold and strong inversion regions. Microelectronics Journal, 43(6), 358-363. doi:10.1016/j.mejo.2012.02.001 | en_US |
dc.identifier.issn | 0026-2692 | - |
dc.identifier.other | EID(2-s2.0-84859744944) | - |
dc.identifier.uri | https://doi.org/10.1016/j.mejo.2012.02.001 | - |
dc.identifier.uri | https://dspace.iiti.ac.in/handle/123456789/6152 | - |
dc.description.abstract | In this paper, we have introduced an analytical subthreshold and strong inversion 3D potential model for rectangular gate (RecG) gate-all-around (GAA) MOSFET. The subthreshold and strong inversion potential distribution in channel region of a RecG MOSFET is obtained respectively by solving 3D Laplace and 3D Poisson equations. The assumed parabolic potential distribution along the z-axis in channel direction is appropriately matched with 3D device simulator after consideration of z-depended characteristic length in subthreshold region. For accurate estimation of short channel effects (SCE), the electrostatics near source and drain is corrected. The precise gate-to-gate potential distribution is obtained after consideration of higher order term in assumed parabolic potential profile. The model compares well with numerical data obtained from the 3D ATLAS as a device simulator and deckbuild as an interactive runtime of Silvaco Inc. © 2012 Elsevier Ltd. All rights reserved. | en_US |
dc.language.iso | en | en_US |
dc.source | Microelectronics Journal | en_US |
dc.subject | Characteristic length | en_US |
dc.subject | Gate-all-around MOSFET | en_US |
dc.subject | Potential | en_US |
dc.subject | Rectangular gate (RecG) | en_US |
dc.subject | Strong inversion | en_US |
dc.subject | Gallium alloys | en_US |
dc.subject | MOSFET devices | en_US |
dc.subject | Poisson equation | en_US |
dc.subject | Three dimensional | en_US |
dc.title | Analytical modeling for 3D potential distribution of rectangular gate (RecG) gate-all-around (GAA) MOSFET in subthreshold and strong inversion regions | en_US |
dc.type | Journal Article | en_US |
Appears in Collections: | Department of Electrical Engineering |
Files in This Item:
There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.
Altmetric Badge: