Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/7783
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dc.contributor.authorSahu, Gayatrien_US
dc.date.accessioned2022-03-17T01:00:00Z-
dc.date.accessioned2022-03-21T11:13:58Z-
dc.date.available2022-03-17T01:00:00Z-
dc.date.available2022-03-21T11:13:58Z-
dc.date.issued2013-
dc.identifier.citationSahu, G. (2013). Raman scattering study on sequentially au implanted sample. Paper presented at the AIP Conference Proceedings, , 1536 293-294. doi:10.1063/1.4810216en_US
dc.identifier.isbn9.78074E+12-
dc.identifier.issn0094-243X-
dc.identifier.otherEID(2-s2.0-84880092141)-
dc.identifier.urihttps://doi.org/10.1063/1.4810216-
dc.identifier.urihttps://dspace.iiti.ac.in/handle/123456789/7783-
dc.description.abstractA sequential two-stage 32 keV and 1.5 MeV Au implantation technique has been used to synthesize strained Si nanocrystals. Samples were annealed in air at temperatures between 500° to 950° C for a fixed annealing time of 1 hr. Annealing of the as-implanted sample at 500° C has been found to result in strain free Si NC formation. Higher temperature annealing is found to result in growth in size from recrystallization of the a-Si matrix. The data could be well explained using a phonon confinement model with an extremely narrow size distribution. © 2013 AIP Publishing LLC.en_US
dc.language.isoenen_US
dc.sourceAIP Conference Proceedingsen_US
dc.titleRaman scattering study on sequentially Au implanted sampleen_US
dc.typeConference Paperen_US
Appears in Collections:Department of Physics

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