Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/7785
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dc.contributor.authorSagdeo, Pankaj R.en_US
dc.contributor.authorBhattacharya, D.en_US
dc.date.accessioned2022-03-17T01:00:00Z-
dc.date.accessioned2022-03-21T11:13:58Z-
dc.date.available2022-03-17T01:00:00Z-
dc.date.available2022-03-21T11:13:58Z-
dc.date.issued2013-
dc.identifier.citationHaque, S. M., Sagdeo, P. R., Bhattacharya, D., Shinde, D. D., Misal, J. S., Prasad, N., & Sahoo, N. K. (2013). Comparison of spectral performance of HfO2/SiO2 and TiO2/SiO2 based high reflecting mirrors. Paper presented at the AIP Conference Proceedings, , 1512 480-481. doi:10.1063/1.4791120en_US
dc.identifier.isbn9.78074E+12-
dc.identifier.issn0094-243X-
dc.identifier.otherEID(2-s2.0-84874881059)-
dc.identifier.urihttps://doi.org/10.1063/1.4791120-
dc.identifier.urihttps://dspace.iiti.ac.in/handle/123456789/7785-
dc.description.abstractHigh Reflecting (HR) mirrors of two different material combinations viz., HfO2/SiO2 and TiO2/SiO2 have been fabricated by asymmetric bipolar pulse DC magnetron sputtering technique. The spectral performances of both the mirrors have been tested in the visible range. Multilayer mirror consisting of TiO2/SiO2 combination shows better spectral performance, viz., 7.2 % higher peak reflectance and 119 nm larger spectral bandwidth, as compared to that of HfO2/SiO 2 combination. The reason is attributed to the higher contrast in index in the first case. © 2013 American Institute of Physics.en_US
dc.language.isoenen_US
dc.sourceAIP Conference Proceedingsen_US
dc.titleComparison of spectral performance of HfO2/SiO2 and TiO2/SiO2 based high reflecting mirrorsen_US
dc.typeConference Paperen_US
Appears in Collections:Department of Physics

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