Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/7995
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dc.contributor.authorPal, Dipayanen_US
dc.contributor.authorSingh, Rinki S.en_US
dc.contributor.authorChattopadhyay, Sudeshnaen_US
dc.date.accessioned2022-03-17T01:00:00Z-
dc.date.accessioned2022-03-21T11:14:39Z-
dc.date.available2022-03-17T01:00:00Z-
dc.date.available2022-03-21T11:14:39Z-
dc.date.issued2020-
dc.identifier.citationSamarasingha, N. S., Zollner, S., Pal, D., Singh, R., & Chattopadhyay, S. (2020). Thickness dependence of infrared lattice absorption and excitonic absorption in ZnO layers on si and SiO2grown by atomic layer deposition. Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, 38(4) doi:10.1116/6.0000184en_US
dc.identifier.issn2166-2746-
dc.identifier.otherEID(2-s2.0-85089772940)-
dc.identifier.urihttps://doi.org/10.1116/6.0000184-
dc.identifier.urihttps://dspace.iiti.ac.in/handle/123456789/7995-
dc.description.abstractUsing spectroscopic ellipsometry from the midinfrared (0.03 eV) to the deep ultraviolet (6.5 eV), the authors determined the thickness dependence of the dielectric function for ZnO thin layers (5-50 nm) on Si and quartz in comparison to bulk ZnO. They observed a small blueshift of the band gap (∼80 meV) in thin ZnO layers due to quantum confinement, which is consistent with a simple effective mass theory in an infinite potential well. There is a drastic reduction in the excitonic effects near the bandgap, especially for thin ZnO on Si, which not only affects the excitonic absorption peak but also lowers the high-frequency dielectric constant by up to 40%. No significant change of the phonon parameters (except an increased broadening) in thin ZnO layers was found. © 2020 Author(s).en_US
dc.language.isoenen_US
dc.publisherAVS Science and Technology Societyen_US
dc.sourceJournal of Vacuum Science and Technology B: Nanotechnology and Microelectronicsen_US
dc.subjectAtomic layer depositionen_US
dc.subjectEnergy gapen_US
dc.subjectII-VI semiconductorsen_US
dc.subjectOxide mineralsen_US
dc.subjectSpectroscopic ellipsometryen_US
dc.subjectZinc oxideen_US
dc.subjectDeep ultravioleten_US
dc.subjectDielectric functionsen_US
dc.subjectEffective-mass theoryen_US
dc.subjectExcitonic absorptionen_US
dc.subjectHigh-frequency dielectricsen_US
dc.subjectLattice absorptionen_US
dc.subjectPhonon parametersen_US
dc.subjectThickness dependenceen_US
dc.subjectSiliconen_US
dc.titleThickness dependence of infrared lattice absorption and excitonic absorption in ZnO layers on Si and SiO2grown by atomic layer depositionen_US
dc.typeJournal Articleen_US
dc.rights.licenseAll Open Access, Bronze-
Appears in Collections:Department of Physics

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