Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/8080
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dc.contributor.authorPakhira, Srimantaen_US
dc.date.accessioned2022-03-17T01:00:00Z-
dc.date.accessioned2022-03-21T11:14:58Z-
dc.date.available2022-03-17T01:00:00Z-
dc.date.available2022-03-21T11:14:58Z-
dc.date.issued2019-
dc.identifier.citationPradhan, N. R., Garcia, C., Lucking, M. C., Pakhira, S., Martinez, J., Rosenmann, D., . . . Balicas, L. (2019). Raman and electrical transport properties of few-layered arsenic-doped black phosphorus. Nanoscale, 11(39), 18449-18463. doi:10.1039/c9nr04598hen_US
dc.identifier.issn2040-3364-
dc.identifier.otherEID(2-s2.0-85073125073)-
dc.identifier.urihttps://doi.org/10.1039/c9nr04598h-
dc.identifier.urihttps://dspace.iiti.ac.in/handle/123456789/8080-
dc.description.abstractBlack phosphorus (b-P) is an allotrope of phosphorus whose properties have attracted great attention. In contrast to other 2D compounds, or pristine b-P, the properties of b-P alloys have yet to be explored. In this report, we present a detailed study on the Raman spectra and on the temperature dependence of the electrical transport properties of As-doped black phosphorus (b-AsP) for an As fraction x = 0.25. The observed complex Raman spectra were interpreted with the support of Density Functional Theory (DFT) calculations since each original mode splits in three due to P-P, P-As, and As-As bonds. Field-effect transistors (FET) fabricated from few-layered b-AsP exfoliated onto Si/SiO2 substrates exhibit hole-doped like conduction with a room temperature ON/OFF current ratio of ∼103 and an intrinsic field-effect mobility approaching ∼300 cm2 V-1 s-1 at 300 K which increases up to 600 cm2 V-1 s-1 at 100 K when measured via a 4-terminal method. Remarkably, these values are comparable to, or higher, than those initially reported for pristine b-P, indicating that this level of As doping is not detrimental to its transport properties. The ON to OFF current ratio is observed to increase up to 105 at 4 K. At high gate voltages b-AsP displays metallic behavior with the resistivity decreasing with decreasing temperature and saturating below T ∼100 K, indicating a gate-induced insulator to metal transition. Similarly to pristine b-P, its transport properties reveal a high anisotropy between armchair (AC) and zig-zag (ZZ) directions. Electronic band structure computed through periodic dispersion-corrected hybrid Density Functional Theory (DFT) indicate close proximity between the Fermi level and the top of the valence band(s) thus explaining its hole doped character. Our study shows that b-AsP has potential for optoelectronics applications that benefit from its anisotropic character and the ability to tune its band gap as a function of the number of layers and As content. © 2019 The Royal Society of Chemistry.en_US
dc.language.isoenen_US
dc.publisherRoyal Society of Chemistryen_US
dc.sourceNanoscaleen_US
dc.subjectAnisotropyen_US
dc.subjectArsenicen_US
dc.subjectEnergy gapen_US
dc.subjectField effect transistorsen_US
dc.subjectHole mobilityen_US
dc.subjectMetal insulator transitionen_US
dc.subjectRaman scatteringen_US
dc.subjectSemiconductor dopingen_US
dc.subjectTemperature distributionen_US
dc.subjectTransport propertiesen_US
dc.subjectElectrical transport propertiesen_US
dc.subjectElectronic band structureen_US
dc.subjectField-effect mobilitiesen_US
dc.subjectHybrid density functional theoryen_US
dc.subjectInsulator-to-metal transitionsen_US
dc.subjectMetallic behaviorsen_US
dc.subjectON/OFF current ratioen_US
dc.subjectTemperature dependenceen_US
dc.subjectDensity functional theoryen_US
dc.titleRaman and electrical transport properties of few-layered arsenic-doped black phosphorusen_US
dc.typeJournal Articleen_US
dc.rights.licenseAll Open Access, Green-
Appears in Collections:Department of Physics

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