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Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/1041
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dc.contributor.authorMeena, Rishikeshen_US
dc.contributor.authorKranti, Abhinav [Guide]en_US
dc.date.accessioned2018-01-25T10:44:45Z-
dc.date.available2018-01-25T10:44:45Z-
dc.date.issued2017-12-08-
dc.identifier.urihttps://dspace.iiti.ac.in/handle/123456789/1041-
dc.language.isoenen_US
dc.publisherDiscipline of Electrical Engineering, IIT Indoreen_US
dc.relation.ispartofseriesBTP331;EE 2017 MEE-
dc.subjectElectrical Engineeringen_US
dc.titleImpact of dopant location on the performance of nanoscale devicesen_US
dc.typeB.Tech Projecten_US
Appears in Collections:Department of Electrical Engineering_BTP

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