Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/15507
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dc.contributor.authorVijayvargiya, Vikasen_US
dc.contributor.authorKumar, Santoshen_US
dc.date.accessioned2025-01-15T07:10:42Z-
dc.date.available2025-01-15T07:10:42Z-
dc.date.issued2014-
dc.identifier.citationVijayvargiya, V., & Vishvakarma, S. K. (2014). Effect of Parasitic Capacitance on DG-HGTFET and Its Influence on Device RF Performance. In V. K. Jain & A. Verma (Eds.), Physics of Semiconductor Devices (pp. 757–759). Springer International Publishing. https://doi.org/10.1007/978-3-319-03002-9_195en_US
dc.identifier.isbn978-331903001-2-
dc.identifier.issn1863-5520-
dc.identifier.otherEID(2-s2.0-85178668498)-
dc.identifier.urihttps://doi.org/10.1007/978-3-319-03002-9_195-
dc.identifier.urihttps://dspace.iiti.ac.in/handle/123456789/15507-
dc.description.abstractIn this paper, for the first time, the design of double-gate hetero-gate-dielectric tunnel field effect transistor (DG-HGTFET) for asymmetric drain doping for RF (Radio frequency) application is discussed. The impact of drain parasitic capacitance on the device performance is analyzed. The results indicate that parasitic capacitances are dominating factor which will degrade the RF characteristics. For this, the RF figures of merit for DG-HGTFET are analyzed in terms of unit-gain cutoff frequency (fT), maximum frequency of oscillation (fmax). Further, asymmetric drain doping is also analyzed for suppressing the ambipolar behavior. © Springer International Publishing Switzerland 2014.en_US
dc.language.isoenen_US
dc.publisherSpringer Science and Business Media Deutschland GmbHen_US
dc.sourceEnvironmental Science and Engineeringen_US
dc.subjectCut-off frequency (fT)en_US
dc.subjecthetero-gate-dielectric tunnel field effect transistor (HG-TFET)en_US
dc.subjectradio frequency (RF)en_US
dc.titleEffect of Parasitic Capacitance on DG-HGTFET and its Influence on Device RF Performanceen_US
dc.typeConference Paperen_US
Appears in Collections:Department of Electrical Engineering

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