Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/15507
Title: Effect of Parasitic Capacitance on DG-HGTFET and its Influence on Device RF Performance
Authors: Vijayvargiya, Vikas
Kumar, Santosh
Keywords: Cut-off frequency (fT);hetero-gate-dielectric tunnel field effect transistor (HG-TFET);radio frequency (RF)
Issue Date: 2014
Publisher: Springer Science and Business Media Deutschland GmbH
Citation: Vijayvargiya, V., & Vishvakarma, S. K. (2014). Effect of Parasitic Capacitance on DG-HGTFET and Its Influence on Device RF Performance. In V. K. Jain & A. Verma (Eds.), Physics of Semiconductor Devices (pp. 757–759). Springer International Publishing. https://doi.org/10.1007/978-3-319-03002-9_195
Abstract: In this paper, for the first time, the design of double-gate hetero-gate-dielectric tunnel field effect transistor (DG-HGTFET) for asymmetric drain doping for RF (Radio frequency) application is discussed. The impact of drain parasitic capacitance on the device performance is analyzed. The results indicate that parasitic capacitances are dominating factor which will degrade the RF characteristics. For this, the RF figures of merit for DG-HGTFET are analyzed in terms of unit-gain cutoff frequency (fT), maximum frequency of oscillation (fmax). Further, asymmetric drain doping is also analyzed for suppressing the ambipolar behavior. © Springer International Publishing Switzerland 2014.
URI: https://doi.org/10.1007/978-3-319-03002-9_195
https://dspace.iiti.ac.in/handle/123456789/15507
ISBN: 978-331903001-2
ISSN: 1863-5520
Type of Material: Conference Paper
Appears in Collections:Department of Electrical Engineering

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