Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/5415
Title: RF performance of ultra low power junctionless MOSFETs
Authors: Kranti, Abhinav
Keywords: Doping concentration;Double gate MOSFET;Junctionless;Junctionless transistors;Parasitic capacitance;RF;Ultra low power;Ultralow power application;Capacitance;MOSFET devices
Issue Date: 2013
Citation: Ghosh, D., Parihar, M. S., & Kranti, A. (2013). RF performance of ultra low power junctionless MOSFETs. Paper presented at the Asia-Pacific Microwave Conference Proceedings, APMC, 787-789. doi:10.1109/APMC.2013.6694932
Abstract: In this work, we report on the doping dependence of RF performance metrics of junctionless transistors and compare the same with conventional undoped inversion mode MOSFETs. It is demonstrated that at low drive currents (∼ 25 μA/μm), JL transistors outperform inversion mode MOSFETs as 20% to 40% higher values of cut-off frequency is obtained for all doping concentrations (1019 cm 3 to 3×1019 cm3). It is shown that the junctionless device architecture is advantageous for ultra low power RF applications as parasitic capacitances are significantly reduced. Scaling trends for cut-off frequency (at lower drain currents) with respect to gate length highlights the potential of junctionless architecture for ultra low power applications. © 2013 IEEE.
URI: https://doi.org/10.1109/APMC.2013.6694932
https://dspace.iiti.ac.in/handle/123456789/5415
ISBN: 9781479914746
Type of Material: Conference Paper
Appears in Collections:Department of Electrical Engineering

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