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DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kranti, Abhinav | en_US |
dc.date.accessioned | 2022-03-17T01:00:00Z | - |
dc.date.accessioned | 2022-03-17T15:41:58Z | - |
dc.date.available | 2022-03-17T01:00:00Z | - |
dc.date.available | 2022-03-17T15:41:58Z | - |
dc.date.issued | 2012 | - |
dc.identifier.citation | Parihar, M. S., Ghosh, D., Armstrong, G. A., Yu, R., Razavi, P., Das, S., . . . Kranti, A. (2012). Sensitivity analysis of steep subthreshold slope (S-slope) in junctionless nanotransistors. Paper presented at the Proceedings of the IEEE Conference on Nanotechnology, doi:10.1109/NANO.2012.6322028 | en_US |
dc.identifier.isbn | 9781467321983 | - |
dc.identifier.issn | 1944-9399 | - |
dc.identifier.other | EID(2-s2.0-84869179191) | - |
dc.identifier.uri | https://doi.org/10.1109/NANO.2012.6322028 | - |
dc.identifier.uri | https://dspace.iiti.ac.in/handle/123456789/5433 | - |
dc.description.abstract | In this work, we analyze the sensitivity of steep subthreshold slope (S-slope) values exhibited by Junctionless (JL) MOSFETs on device parameters. The steep S-slope values (< 60 mV/decade) achieved by JL MOSFET due to impact ionization are more sensitive to film thickness than gate length and oxide thickness. JL MOSFETs designed with higher doping concentrations show steeper S-slope values at lower drain bias than those doped with lower doping concentrations. It is demonstrated that for certain set of parameters, steep S-slope JL nanotransistors can latch to the on state and fail to turn-off. The work identifies the possible set of device parameters for which steep S-slope values can be observed in JL nanotransistors. © 2012 IEEE. | en_US |
dc.language.iso | en | en_US |
dc.source | Proceedings of the IEEE Conference on Nanotechnology | en_US |
dc.subject | Device parameters | en_US |
dc.subject | Doping concentration | en_US |
dc.subject | Drain bias | en_US |
dc.subject | Gate length | en_US |
dc.subject | Junctionless | en_US |
dc.subject | MOS-FET | en_US |
dc.subject | MOSFETs | en_US |
dc.subject | Nano transistors | en_US |
dc.subject | Oxide thickness | en_US |
dc.subject | Steep S-slope | en_US |
dc.subject | Subthreshold slope | en_US |
dc.subject | Impact ionization | en_US |
dc.subject | Nanotechnology | en_US |
dc.subject | Nanowires | en_US |
dc.subject | MOSFET devices | en_US |
dc.title | Sensitivity analysis of steep subthreshold slope (S-slope) in Junctionless nanotransistors | en_US |
dc.type | Conference Paper | en_US |
Appears in Collections: | Department of Electrical Engineering |
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