Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/5433
Title: Sensitivity analysis of steep subthreshold slope (S-slope) in Junctionless nanotransistors
Authors: Kranti, Abhinav
Keywords: Device parameters;Doping concentration;Drain bias;Gate length;Junctionless;MOS-FET;MOSFETs;Nano transistors;Oxide thickness;Steep S-slope;Subthreshold slope;Impact ionization;Nanotechnology;Nanowires;MOSFET devices
Issue Date: 2012
Citation: Parihar, M. S., Ghosh, D., Armstrong, G. A., Yu, R., Razavi, P., Das, S., . . . Kranti, A. (2012). Sensitivity analysis of steep subthreshold slope (S-slope) in junctionless nanotransistors. Paper presented at the Proceedings of the IEEE Conference on Nanotechnology, doi:10.1109/NANO.2012.6322028
Abstract: In this work, we analyze the sensitivity of steep subthreshold slope (S-slope) values exhibited by Junctionless (JL) MOSFETs on device parameters. The steep S-slope values (< 60 mV/decade) achieved by JL MOSFET due to impact ionization are more sensitive to film thickness than gate length and oxide thickness. JL MOSFETs designed with higher doping concentrations show steeper S-slope values at lower drain bias than those doped with lower doping concentrations. It is demonstrated that for certain set of parameters, steep S-slope JL nanotransistors can latch to the on state and fail to turn-off. The work identifies the possible set of device parameters for which steep S-slope values can be observed in JL nanotransistors. © 2012 IEEE.
URI: https://doi.org/10.1109/NANO.2012.6322028
https://dspace.iiti.ac.in/handle/123456789/5433
ISBN: 9781467321983
ISSN: 1944-9399
Type of Material: Conference Paper
Appears in Collections:Department of Electrical Engineering

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