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DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kushwaha, C. B. | en_US |
dc.contributor.author | Vishvakarma, Santosh Kumar | en_US |
dc.date.accessioned | 2022-03-17T01:00:00Z | - |
dc.date.accessioned | 2022-03-17T15:41:59Z | - |
dc.date.available | 2022-03-17T01:00:00Z | - |
dc.date.available | 2022-03-17T15:41:59Z | - |
dc.date.issued | 2012 | - |
dc.identifier.citation | Kushwah, C., & Vishvakarma, S. K. (2012). Ultra-low power sub-threshold SRAM cell design to improve read static noise margin doi:10.1007/978-3-642-31494-0_16 | en_US |
dc.identifier.isbn | 9783642314933 | - |
dc.identifier.issn | 0302-9743 | - |
dc.identifier.other | EID(2-s2.0-84864302525) | - |
dc.identifier.uri | https://doi.org/10.1007/978-3-642-31494-0_16 | - |
dc.identifier.uri | https://dspace.iiti.ac.in/handle/123456789/5437 | - |
dc.description.abstract | Sub-threshold circuit design is a prevalent selection for ultra-low power (ULP) systems. Static random access memory (SRAM) is an important component in these systems therefore ultra-low power SRAM has become popular. Operation of standard 6T SRAM at sub or near-threshold voltages is unfeasible, predominantly due to degraded static noise margin (SNM) and fluctuations in MOSFET currents because of process variations at ultra-low voltages. Hence, many researchers have deliberated divergent configuration SRAMs for sub-threshold operations having 8T, 9T and 10T bit-cells for enhanced stability. Sub-threshold SRAMs have many important design issues such as cell stability, leakage current and area. In this paper, we give a deep insight of sub-threshold SRAM cell design issues and discuss several important circuit techniques. We emphasize on SRAM cell stability during read operation, develop read port circuits to design an ultra-low power sub-threshold SRAM cell. We propose 9T bit-cell that effectively improve read margin, thereby achieving high cell stability at 45nm technology node. The proposed design shows the full functionality of SRAM cell at a voltage down to around 500-200mV. The proposed design employs standard circuit techniques to improve read margins, as well as to allow a large number of bit-cells on single bit-line. © 2012 Springer-Verlag. | en_US |
dc.language.iso | en | en_US |
dc.source | Lecture Notes in Computer Science (including subseries Lecture Notes in Artificial Intelligence and Lecture Notes in Bioinformatics) | en_US |
dc.subject | 45nm technology | en_US |
dc.subject | 6T-SRAM | en_US |
dc.subject | Bit lines | en_US |
dc.subject | Cell stability | en_US |
dc.subject | Circuit designs | en_US |
dc.subject | Circuit techniques | en_US |
dc.subject | Design issues | en_US |
dc.subject | Enhanced stability | en_US |
dc.subject | MOS-FET | en_US |
dc.subject | Process Variation | en_US |
dc.subject | Read margin | en_US |
dc.subject | Read operation | en_US |
dc.subject | RSNM | en_US |
dc.subject | SRAM Cell | en_US |
dc.subject | Sram cell stability | en_US |
dc.subject | Static noise margin | en_US |
dc.subject | Static random access memory | en_US |
dc.subject | Sub-threshold SRAM | en_US |
dc.subject | Subthreshold | en_US |
dc.subject | Subthreshold operation | en_US |
dc.subject | ULP | en_US |
dc.subject | Ultra-low power | en_US |
dc.subject | Ultralow voltage | en_US |
dc.subject | Cells | en_US |
dc.subject | Cytology | en_US |
dc.subject | Design | en_US |
dc.subject | Electron beam lithography | en_US |
dc.subject | Integrated circuit manufacture | en_US |
dc.subject | Low power electronics | en_US |
dc.subject | Threshold voltage | en_US |
dc.subject | Static random access storage | en_US |
dc.title | Ultra-low power sub-threshold SRAM cell design to improve read static noise margin | en_US |
dc.type | Conference Paper | en_US |
Appears in Collections: | Department of Electrical Engineering |
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