Please use this identifier to cite or link to this item:
https://dspace.iiti.ac.in/handle/123456789/5790
Title: | Modeling Short-Channel Effects in Core-Shell Junctionless MOSFET |
Authors: | Jaiswal, Nivedita Kranti, Abhinav |
Keywords: | Degrees of freedom (mechanics);MOSFET devices;Threshold voltage;Core shell;Doping profiles;Double gate;junctionless (JL);Subthreshold;Shells (structures) |
Issue Date: | 2019 |
Publisher: | Institute of Electrical and Electronics Engineers Inc. |
Citation: | Jaiswal, N., & Kranti, A. (2019). Modeling short-channel effects in core-shell junctionless MOSFET. IEEE Transactions on Electron Devices, 66(1), 292-299. doi:10.1109/TED.2018.2881006 |
Abstract: | In this paper, we propose a model for estimating short-channel effects (SCEs) in the shell-doped double-gate junctionless (JL) MOSFET. The main emphasis of this paper is to estimate SCEs by effectively capturing source/drain (S/D) extensions beyond the gate edges for different values of undoped core thickness (Tcore), shell doping (Nd), gate length (Lg), and gate (Vgs) and drain (Vds) biases in subthreshold regime. The threshold voltage (Vth), drain-induced barrier lowering and subthreshold swing (S), extracted from transfer characteristics, are in good agreement with the simulation results. Results highlight the utility of shell doping and core thickness to provide an additional degree of freedomto controlSCEs. The proposedmodel can be useful in estimating SCEs and optimizing core-shell JL architecture for low-power applications. © 1963-2012 IEEE. |
URI: | https://doi.org/10.1109/TED.2018.2881006 https://dspace.iiti.ac.in/handle/123456789/5790 |
ISSN: | 0018-9383 |
Type of Material: | Journal Article |
Appears in Collections: | Department of Electrical Engineering |
Files in This Item:
There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.
Altmetric Badge: