Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/5832
Title: Impact of Schottky junctions in the transformation of switching modes in amorphous Y2O3-based memristive system
Authors: Mandal, Biswajit
Mukherjee, Shaibal
Keywords: Amorphous films;Ion beams;Schottky barrier diodes;Semiconductor junctions;Sputtering;Switching;Yttrium oxide;Conduction Mechanism;DIBS;Dual ion beam sputtering;Memristor;Schottky;Schottky Barrier Diode(SBD);Transformation mechanisms;Y2O3;Memristors
Issue Date: 2018
Publisher: Institute of Physics Publishing
Citation: Das, M., Kumar, A., Mandal, B., Htay, M. T., & Mukherjee, S. (2018). Impact of schottky junctions in the transformation of switching modes in amorphous Y2O3-based memristive system. Journal of Physics D: Applied Physics, 51(31) doi:10.1088/1361-6463/aacf14
Abstract: In this report, we study factors that dominate the mode transformation of resistive switching (RS) in yttria based memristive devices. It is found that amorphous yttria films are more suitable for RS whereas highly crystalline films are counterproductive for RS. The transformation from unipolar to bipolar resistive switching mode is demonstrated in our devices via moving from a system of single Schottky barrier diode (SBD) to double SBD. The conduction mechanism behind these transformation mechanisms is found to be predominantly interfacial. We also report a forming-free Al/Y2O3/Al based memristor fabricated by the dual ion beam sputtering without any post-processing steps for the first time. It shows stable switching behavior for >29 000 cycles with good retention (105 s) characteristics. © 2018 IOP Publishing Ltd.
URI: https://doi.org/10.1088/1361-6463/aacf14
https://dspace.iiti.ac.in/handle/123456789/5832
ISSN: 0022-3727
Type of Material: Journal Article
Appears in Collections:Department of Electrical Engineering

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