Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/5900
Title: Vertical Transistor with n-Bridge and Body on Gate for Low-Power 1T-DRAM Application
Authors: Kranti, Abhinav
Keywords: Field effect transistors;Impact ionization;Landforms;Wetlands;1t drams;Conventional currents;junctionless;Low power application;Programming window;Short-channel effect;Vertical channels;Vertical transistors;Dynamic random access storage
Issue Date: 2017
Publisher: Institute of Electrical and Electronics Engineers Inc.
Citation: Lin, J. -., Lin, H. -., Chen, Y. -., Yu, C. -., Kranti, A., Lin, C. -., & Lee, W. -. (2017). Vertical transistor with n-bridge and body on gate for low-power 1T-DRAM application. IEEE Transactions on Electron Devices, 64(12), 4937-4945. doi:10.1109/TED.2017.2766563
Abstract: In this paper, we propose a vertical transistor with n-bridge and body on gate (BOG-DRAM) for Low-power 1T-DRAM application. The vertical channel of the device can reduce the short-channel effect and improve scalability. The storage region stacked on the gate leads to the efficient utilization of storage space. The device with junctionless channel layers on three sides can improve writing time. The conventional current bridge device only has one side gate-control depletion region, but the proposed BOG-DRAM has triple-side gate-control depletion region which can improve programming window at shorter gate lengths. BOG-DRAM achieves programming window of 33.6μ A/μ m when the storage length is 20 nm. In addition, the work function offset is exploited for low-power application. © 1963-2012 IEEE.
URI: https://doi.org/10.1109/TED.2017.2766563
https://dspace.iiti.ac.in/handle/123456789/5900
ISSN: 0018-9383
Type of Material: Journal Article
Appears in Collections:Department of Electrical Engineering

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