Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/6138
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dc.contributor.authorKranti, Abhinaven_US
dc.date.accessioned2022-03-17T01:00:00Z-
dc.date.accessioned2022-03-17T15:46:37Z-
dc.date.available2022-03-17T01:00:00Z-
dc.date.available2022-03-17T15:46:37Z-
dc.date.issued2013-
dc.identifier.citationSingh Parihar, M., Ghosh, D., & Kranti, A. (2013). Occurrence of zero gate oxide thickness coefficient in junctionless transistors. Applied Physics Letters, 102(20) doi:10.1063/1.4807763en_US
dc.identifier.issn0003-6951-
dc.identifier.otherEID(2-s2.0-84878371775)-
dc.identifier.urihttps://doi.org/10.1063/1.4807763-
dc.identifier.urihttps://dspace.iiti.ac.in/handle/123456789/6138-
dc.description.abstractIn this paper, we report on the occurrence of Zero Gate Oxide Thickness Coefficient (Z T o x C) in junctionless transistors. It is shown that due to bipolar effects, drain current increases with an increase in oxide thickness up to a certain gate voltage (V Z T o x C), whereas beyond (V Z T o x C), current follows the conventional transistor theory and reduces with an increment in gate oxide thickness. These two different trends lead to a condition of drain current being independent of oxide thickness at the gate bias corresponding to V Z T o x C. The occurrence of Z T o x C classifies the predominant conduction mechanism into bipolar or unipolar mode in junctionless transistors. © 2013 AIP Publishing LLC.en_US
dc.language.isoenen_US
dc.sourceApplied Physics Lettersen_US
dc.subjectBipolar effectsen_US
dc.subjectConduction Mechanismen_US
dc.subjectConventional transistorsen_US
dc.subjectCurrent increaseen_US
dc.subjectGate oxide thicknessen_US
dc.subjectGate voltagesen_US
dc.subjectJunctionless transistorsen_US
dc.subjectOxide thicknessen_US
dc.subjectGates (transistor)en_US
dc.subjectLead oxideen_US
dc.subjectTransistorsen_US
dc.titleOccurrence of zero gate oxide thickness coefficient in junctionless transistorsen_US
dc.typeJournal Articleen_US
Appears in Collections:Department of Electrical Engineering

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