Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/6138
Title: Occurrence of zero gate oxide thickness coefficient in junctionless transistors
Authors: Kranti, Abhinav
Keywords: Bipolar effects;Conduction Mechanism;Conventional transistors;Current increase;Gate oxide thickness;Gate voltages;Junctionless transistors;Oxide thickness;Gates (transistor);Lead oxide;Transistors
Issue Date: 2013
Citation: Singh Parihar, M., Ghosh, D., & Kranti, A. (2013). Occurrence of zero gate oxide thickness coefficient in junctionless transistors. Applied Physics Letters, 102(20) doi:10.1063/1.4807763
Abstract: In this paper, we report on the occurrence of Zero Gate Oxide Thickness Coefficient (Z T o x C) in junctionless transistors. It is shown that due to bipolar effects, drain current increases with an increase in oxide thickness up to a certain gate voltage (V Z T o x C), whereas beyond (V Z T o x C), current follows the conventional transistor theory and reduces with an increment in gate oxide thickness. These two different trends lead to a condition of drain current being independent of oxide thickness at the gate bias corresponding to V Z T o x C. The occurrence of Z T o x C classifies the predominant conduction mechanism into bipolar or unipolar mode in junctionless transistors. © 2013 AIP Publishing LLC.
URI: https://doi.org/10.1063/1.4807763
https://dspace.iiti.ac.in/handle/123456789/6138
ISSN: 0003-6951
Type of Material: Journal Article
Appears in Collections:Department of Electrical Engineering

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