Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/6139
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dc.contributor.authorKranti, Abhinaven_US
dc.date.accessioned2022-03-17T01:00:00Z-
dc.date.accessioned2022-03-17T15:46:38Z-
dc.date.available2022-03-17T01:00:00Z-
dc.date.available2022-03-17T15:46:38Z-
dc.date.issued2013-
dc.identifier.citationSingh Parihar, M., Ghosh, D., & Kranti, A. (2013). Single transistor latch phenomenon in junctionless transistors. Journal of Applied Physics, 113(18) doi:10.1063/1.4803879en_US
dc.identifier.issn0021-8979-
dc.identifier.otherEID(2-s2.0-84878072351)-
dc.identifier.urihttps://doi.org/10.1063/1.4803879-
dc.identifier.urihttps://dspace.iiti.ac.in/handle/123456789/6139-
dc.description.abstractIn this work, we report on the single transistor latch phenomenon in junctionless transistors. In the latch condition, the device is unable to turn-off despite a reduction in gate bias. It is shown that impact ionization induced latch condition can occur due to an increase in drain bias, silicon film thickness, gate oxide thickness, and doping concentration. The latch phenomenon is explained in terms of generation-recombination rates, electrostatic potential, electric field distribution and product of current density and electric field (J·E). As latch condition is undesirable for dynamic memory applications, the work highlights the significance of (J·E) as a performance metric to avoid the junctionless transistor being driven into the latch mode. © 2013 AIP Publishing LLC.en_US
dc.language.isoenen_US
dc.sourceJournal of Applied Physicsen_US
dc.subjectDoping concentrationen_US
dc.subjectElectric field distributionsen_US
dc.subjectElectrostatic potentialsen_US
dc.subjectGate oxide thicknessen_US
dc.subjectGeneration-recombinationen_US
dc.subjectJunctionless transistorsen_US
dc.subjectPerformance metricesen_US
dc.subjectSilicon film thicknessen_US
dc.subjectElectric fieldsen_US
dc.subjectImpact ionizationen_US
dc.subjectTransistorsen_US
dc.titleSingle transistor latch phenomenon in junctionless transistorsen_US
dc.typeJournal Articleen_US
Appears in Collections:Department of Electrical Engineering

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