Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/6139
Title: Single transistor latch phenomenon in junctionless transistors
Authors: Kranti, Abhinav
Keywords: Doping concentration;Electric field distributions;Electrostatic potentials;Gate oxide thickness;Generation-recombination;Junctionless transistors;Performance metrices;Silicon film thickness;Electric fields;Impact ionization;Transistors
Issue Date: 2013
Citation: Singh Parihar, M., Ghosh, D., & Kranti, A. (2013). Single transistor latch phenomenon in junctionless transistors. Journal of Applied Physics, 113(18) doi:10.1063/1.4803879
Abstract: In this work, we report on the single transistor latch phenomenon in junctionless transistors. In the latch condition, the device is unable to turn-off despite a reduction in gate bias. It is shown that impact ionization induced latch condition can occur due to an increase in drain bias, silicon film thickness, gate oxide thickness, and doping concentration. The latch phenomenon is explained in terms of generation-recombination rates, electrostatic potential, electric field distribution and product of current density and electric field (J·E). As latch condition is undesirable for dynamic memory applications, the work highlights the significance of (J·E) as a performance metric to avoid the junctionless transistor being driven into the latch mode. © 2013 AIP Publishing LLC.
URI: https://doi.org/10.1063/1.4803879
https://dspace.iiti.ac.in/handle/123456789/6139
ISSN: 0021-8979
Type of Material: Journal Article
Appears in Collections:Department of Electrical Engineering

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