Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/6149
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dc.contributor.authorKranti, Abhinaven_US
dc.date.accessioned2022-03-17T01:00:00Z-
dc.date.accessioned2022-03-17T15:46:43Z-
dc.date.available2022-03-17T01:00:00Z-
dc.date.available2022-03-17T15:46:43Z-
dc.date.issued2012-
dc.identifier.citationGhosh, D., Parihar, M. S., Armstrong, G. A., & Kranti, A. (2012). High-performance junctionless MOSFETs for ultralow-power analog/RF applications. IEEE Electron Device Letters, 33(10), 1477-1479. doi:10.1109/LED.2012.2210535en_US
dc.identifier.issn0741-3106-
dc.identifier.otherEID(2-s2.0-84866933974)-
dc.identifier.urihttps://doi.org/10.1109/LED.2012.2210535-
dc.identifier.urihttps://dspace.iiti.ac.in/handle/123456789/6149-
dc.description.abstractIn this letter, we demonstrate the usefulness of ultralow-power (ULP) junctionless (JL) MOSFETs in achieving improved analog/RF metrics as compared to nonunderlap and underlap MOSFETs. At a drain current (Irm ds) of 10 \mu \hboxA/\mu\hboxm, JL devices achieve two times higher values of cutoff frequency (f-T) and maximum oscillation frequency (frm MAX) along with 65% improvement in voltage gain (Arm VO) in comparison to conventional nonunderlap MOSFETs. ULP JL devices, which do not require source/drain (S/D) profile optimization, can perform comparably to underlap devices, thereby relaxing the stringent process constraints associated with S/D profile optimization in nanoscale devices. The results highlight new opportunities for realizing future ULP analog/RF design with JL transistors. © 2012 IEEE.en_US
dc.language.isoenen_US
dc.sourceIEEE Electron Device Lettersen_US
dc.subjectAnalog/RFen_US
dc.subjectDouble gate MOSFETen_US
dc.subjectJunctionlessen_US
dc.subjectUltra-low poweren_US
dc.subjectunderlap source/drain (S/D)en_US
dc.subjectCutoff frequencyen_US
dc.subjectOptimizationen_US
dc.subjectMOSFET devicesen_US
dc.titleHigh-performance junctionless MOSFETs for ultralow-power analog/RF applicationsen_US
dc.typeJournal Articleen_US
Appears in Collections:Department of Electrical Engineering

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