Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/7203
Title: Critical review of electrochemical honing: sustainable and alternative gear finishing process. Part 2: effects of various process parameters on surface characteristics and material removal rate
Authors: Jain, Neelesh Kumar
Keywords: Finishing;Gears;Metal finishing;Surfaces;Electrochemical honing;Finishing process;Material removal rate;PECH;Process parameters;Pulsed-electrochemical;Surface characteristics;Surface finishing;Honing
Issue Date: 2017
Publisher: Taylor and Francis Ltd.
Citation: Pathak, S., & Jain, N. K. (2017). Critical review of electrochemical honing: Sustainable and alternative gear finishing process. part 2: Effects of various process parameters on surface characteristics and material removal rate. Transactions of the Institute of Metal Finishing, 95(5), 241-254. doi:10.1080/00202967.2017.1338401
Abstract: Part 1 of this review discussed conventional gear surface finishing processes and their advantages and limitations, and introduced the electrochemical honing (ECH) process (and its extension of pulsed electrochemical honing (PECH)), to improve the surface characteristics of different types of gears, working principles, mechanism of material removal and equipment details. Part 2 gives a review of past work, and discusses effects of various process parameters on surface characteristics and finishing productivity (i.e. material removal rate), advantages and limitations, and its other applications. The objective of this review paper is to present ECH/PECH as one emerging alternative, economical, productive and sustainable gear finishing process. © 2017 Institute of Materials Finishing.
URI: https://doi.org/10.1080/00202967.2017.1338401
https://dspace.iiti.ac.in/handle/123456789/7203
ISSN: 0020-2967
Type of Material: Journal Article
Appears in Collections:Department of Mechanical Engineering

Files in This Item:
There are no files associated with this item.


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

Altmetric Badge: