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https://dspace.iiti.ac.in/handle/123456789/7591
| Title: | Explicit Model of Channel Charge, Backscattering, and Mobility for Graphene FET in Quasi-Ballistic Regime |
| Authors: | Kushwaha, Ajay Kumar Vishvakarma, Santosh Kumar |
| Keywords: | Backscattering;Ballistics;Carrier mobility;Charge density;Drain current;Electric fields;Electromagnetic wave scattering;Field effect transistors;Graphene;Mathematical models;Scattering;Backscattering coefficients;Drift diffusion;Fermi velocities;Integrated circuit modeling;Quasi-ballistic;Two-dimensional displays;Graphene transistors |
| Issue Date: | 2018 |
| Publisher: | Institute of Electrical and Electronics Engineers Inc. |
| Citation: | Upadhyay, A. K., Kushwaha, A. K., Rastogi, P., Chauhan, Y. S., & Vishvakarma, S. K. (2018). Explicit model of channel charge, backscattering, and mobility for graphene FET in quasi-ballistic regime. IEEE Transactions on Electron Devices, 65(12), 5468-5474. doi:10.1109/TED.2018.2877631 |
| Abstract: | Ballistic (collision free) and drift-diffusive (collision dominated) transport mechanisms are both present in graphene, and they together contribute in the current conduction in a graphene FET (GFET). In this paper, we propose an analytical drain current model based on ballistic (nB) and drift-diffusive (nD) charge densities, backscattering coefficient (R), and quasi-ballisticmobility (μeff).nB is calculated using the McKelvey flux theory and nD using the surface potential approach. A closed-form analytical expression is derived for the backscattering coefficient, which is valid under both low and high electric field conditions. The effective quasi-ballistic mobility is obtained by considering both scattering-dominated and scattering free mobilities. The proposed model is well aligned with experimental data, in all regions of operation, for single- and double-gate GFETs. © 2018 IEEE. |
| URI: | https://doi.org/10.1109/TED.2018.2877631 https://dspace.iiti.ac.in/handle/123456789/7591 |
| ISSN: | 0018-9383 |
| Type of Material: | Journal Article |
| Appears in Collections: | Department of Metallurgical Engineering and Materials Sciences |
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