Please use this identifier to cite or link to this item: https://dspace.iiti.ac.in/handle/123456789/7995
Title: Thickness dependence of infrared lattice absorption and excitonic absorption in ZnO layers on Si and SiO2grown by atomic layer deposition
Authors: Pal, Dipayan
Singh, Rinki S.
Chattopadhyay, Sudeshna
Keywords: Atomic layer deposition;Energy gap;II-VI semiconductors;Oxide minerals;Spectroscopic ellipsometry;Zinc oxide;Deep ultraviolet;Dielectric functions;Effective-mass theory;Excitonic absorption;High-frequency dielectrics;Lattice absorption;Phonon parameters;Thickness dependence;Silicon
Issue Date: 2020
Publisher: AVS Science and Technology Society
Citation: Samarasingha, N. S., Zollner, S., Pal, D., Singh, R., & Chattopadhyay, S. (2020). Thickness dependence of infrared lattice absorption and excitonic absorption in ZnO layers on si and SiO2grown by atomic layer deposition. Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, 38(4) doi:10.1116/6.0000184
Abstract: Using spectroscopic ellipsometry from the midinfrared (0.03 eV) to the deep ultraviolet (6.5 eV), the authors determined the thickness dependence of the dielectric function for ZnO thin layers (5-50 nm) on Si and quartz in comparison to bulk ZnO. They observed a small blueshift of the band gap (∼80 meV) in thin ZnO layers due to quantum confinement, which is consistent with a simple effective mass theory in an infinite potential well. There is a drastic reduction in the excitonic effects near the bandgap, especially for thin ZnO on Si, which not only affects the excitonic absorption peak but also lowers the high-frequency dielectric constant by up to 40%. No significant change of the phonon parameters (except an increased broadening) in thin ZnO layers was found. © 2020 Author(s).
URI: https://doi.org/10.1116/6.0000184
https://dspace.iiti.ac.in/handle/123456789/7995
ISSN: 2166-2746
Type of Material: Journal Article
Appears in Collections:Department of Physics

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