Please use this identifier to cite or link to this item:
https://dspace.iiti.ac.in/handle/123456789/2199
| Title: | Optimisation and effective GaN Surface passivation by plasma enhanced chemical vapor deposition of silicon oxide |
| Authors: | Gupta, Ashutosh Shirage, Parasharam M. [Guide] |
| Keywords: | Metallurgy Engineering and Materials Science |
| Issue Date: | 4-Dec-2019 |
| Publisher: | Discipline of Metallurgy Engineering and Materials Science, IIT Indore |
| Series/Report no.: | BTP568;MEMS 2019 GUP |
| URI: | https://dspace.iiti.ac.in/handle/123456789/2199 |
| Type of Material: | B.Tech Project |
| Appears in Collections: | Department of Metallurgical Engineering and Materials Science_BTP |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| BTP_568_Ashutosh_Gupta_160005008.pdf | 2.46 MB | Adobe PDF |  View/Open |
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